Search results for "Total thickness"

showing 2 items of 2 documents

Elektronenmikroskopische Untersuchung von Transversalschnitten d�nner Schichten auf festen Unterlagen

1969

A method is described which allows to prepare transverse sections of thin films by means of an ion etching technique so that transmission electron micrographs of the film structure can be carried out. A section through a 6-layered optical film with a total thickness of 0.62 μm is shown as an example.

Nuclear and High Energy PhysicsOptical filmTransverse planeMaterials scienceEtching (microfabrication)Transmission electron micrographfungiNuclear fusionComposite materialThin filmTotal thicknessIonZeitschrift f�r Physik
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Depth profiling of Al2O3 + TiO2 nanolaminates by means of a time-of-flight energy spectrometer

2011

Atomic layer deposition (ALD) is currently a widespread method to grow conformal thin films with a sub-nm thickness control. By using ALD for nanolaminate oxides, it is possible to fine tune the electrical, optical and mechanical properties of thin films. In this study the elemental depth profiles and surface roughnesses were determined for Al2O3 + TiO2 nanolaminates with nominal single-layer thicknesses of 1, 2, 5, 10 and 20 nm and total thickness between 40 nm and 60 nm. The depth profiles were measured by means of a time-of-flight elastic recoil detection analysis (ToF-ERDA) spectrometer recently installed at the University of Jyväskylä. In TOF-E measurements 63Cu, 35Cl, 12C and 4He ions…

ToF-ERDANuclear and High Energy Physicsdepth profilingMaterials scienceSpectrometerta114business.industryAnalytical chemistryERDIonTotal thicknessElastic recoil detectionTime of flightAtomic layer depositionnanolaminateAl2O3 and TiO2ALDOptoelectronicsThin filmbusinessInstrumentationEnergy (signal processing)
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